发明名称 PLASMA PROCESSING APPARATUS, FAULT DETECTION APPARATUS, AND FAULT DETECTION METHOD
摘要 PROBLEM TO BE SOLVED: To detect faults in a mass flow controller without providing a gas flow meter in piping where the mass flow controller is located. SOLUTION: Gas introduction piping 20 introduces process gas for plasma generation into a processing chamber 3. A pressure regulating valve 50 is provided at an exhaust pipe 5. A mass flow controller 2 is provided at the gas introduction piping 20 and regulates the flow rate of the process gas. A pressure gauge 4 detects the pressure in the processing chamber 3. A control unit 6 controls the pressure within the processing chamber 3 by controlling an extent of opening of the pressure regulating valve 50 based on values detected by the pressure gauge 4. The control unit 6 receives flow rate data indicating the flow rate of the process gas from the mass flow controller 2 and determines the presence or absence of faults at the mass flow controller 2 based on the flow rate data and an extent of fluctuation of the values detected by the pressure gauge 4 when a high-frequency is inputted to an electrode. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010247028(A) 申请公布日期 2010.11.04
申请号 JP20090097188 申请日期 2009.04.13
申请人 RENESAS ELECTRONICS CORP 发明人 YAMANE TAKASHI
分类号 B01J19/08 主分类号 B01J19/08
代理机构 代理人
主权项
地址