摘要 |
Provided are a source supplying unit, a thin film depositing apparatus including the source supplying unit, and a method for depositing a thin film. The source supplying unit includes a liquefaction part configured to liquefy a source material, an evaporation part communicating with the liquefaction part to evaporate the liquefied source material, and an injector communicating with the evaporation part to inject the evaporated source material. The liquefaction part includes a pot having a cylinder shape to store the source material, a piston part inserted to a side of the pot to discharge the source material, and a liquefaction heating part configured to heat the pot to liquefy the source material. After a solid source material is liquefied, a necessary portion is evaporated from the source material and supplied, thus achieving large capacity in source material and minimizing the amount of heat consumed for evaporating and supplying the source material. |
申请人 |
SNU PRECISION CO., LTD;KANG, CHANG HO;NAMGOONG, SUNG TAE;RHO, JUN SEO;CHO, WHANG SIN;YOON, HYUNG SEOK;BAE, KYUNG BIN |
发明人 |
KANG, CHANG HO;NAMGOONG, SUNG TAE;RHO, JUN SEO;CHO, WHANG SIN;YOON, HYUNG SEOK;BAE, KYUNG BIN |