| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an inspection device and inspection method capable of easily obtaining high detection sensitivity, and to provide a manufacturing method of a pattern substrate. Ž<P>SOLUTION: The inspection device comprises a laser light source 101, an objective lens 102 for forming an optical spot on a sample surface, a photodetector 110 for outputting an output signal based on a reflected light reflected on the sample surface, of light beams coming into a sample 107 from the objective lens 102, a stage 108 that scans relative positions of the sample 107 and the optical spot along a scan line and scans the region where the optical spot overlaps the optical spot of the adjacent scan line so as to shine it, a defect candidate detecting section 202 for detecting a defect candidate based on the output signal from the photodetector 110, and a defect determining section 208 for determining whether it is a defect based on the distance between the defect candidates detected in the defect candidate detecting sections 202. Ž<P>COPYRIGHT: (C)2006,JPO&NCIPI Ž</p> |
