| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an active ray-sensitive or radiation-sensitive resin composition, with which a pattern having good corner proximity and fewer developing defects can be formed, and which causes little elution of an acid into an immersion liquid and shows proper properties to the immersion liquid, and to provide a method for forming a pattern by using the composition. <P>SOLUTION: The composition includes (A) a resin whose solubility with an alkali developing solution is increased by the action of an acid; (B) a compound generating an acid by irradiation with active rays or radiation; and (C) a resin containing a repeating unit having a polarity conversion group that is decomposed by the action of an alkali developing solution, to increase the solubility with the alkali developing solution, and containing at least either a fluorine atom or a silicon atom, and (D) a nitrogen-containing organic compound, having a nitrogen-containing hetero ring expressed by formula (1). In the formula, R<SP>1</SP>represents a 2-20C straight-chain, branched or cyclic divalent substituent forming, together with nitrogen atoms bonded to both ends, a nitrogen-containing hetero aliphatic ring or a nitrogen-containing hetero aromatic ring, which may include an oxygen atom, nitrogen atom, sulfur atom or halogen atom; R<SP>2</SP>represents a 2-10C straight-chain or branched alkylene group which may include a carbonyl group; and R<SP>3</SP>represents a saturated or unsaturated hydrocarbon group or acyl group which may include a hydroxyl group, carbonyl group, ester group, ether group, cyano group or steroid skeleton or a combination of two or more of them. <P>COPYRIGHT: (C)2011,JPO&INPIT |
