发明名称 METHOD FOR MANUFACTURING SUBSTRATE WITH FUNCTIONAL FILM
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a substrate with a functional film capable of enhancing impact resistance with a simple method while having a desired optical function. <P>SOLUTION: In the method for manufacturing the substrate with the functional film by which an optical thin film is formed by vapor deposition of a metal oxide on a substrate made of a transparent resin under a nearly vacuum atmosphere using a physical vapor deposition method, when the metal oxide is deposited on the substrate, excess at least one of a gas selected from any of oxygen, nitrogen and a rare gas is introduced in the range of 1.0&times;10<SP>-2</SP>to 9.0&times;10<SP>-1</SP>Pa to perform vapor deposition. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010248580(A) 申请公布日期 2010.11.04
申请号 JP20090100219 申请日期 2009.04.16
申请人 NIDEK CO LTD 发明人 OKA SHIGEKI
分类号 C23C14/08;G02B1/11 主分类号 C23C14/08
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