| 摘要 |
PROBLEM TO BE SOLVED: To enhance the detection sensitivity on an exposed portion of a photoconductive layer of an electrophotographic photoreceptor. SOLUTION: In the method for manufacturing the electrophotographic photoreceptor with at least an inspection process, the electrophotographic photoreceptor includes at least a photoconductive layer and a surface layer. The inspection process includes: an irradiation step of irradiating the electrophotographic photoreceptor having the outermost surface including a first portion as the surface layer and a second portion where the photoconductor layer is exposed to the outside, with inspection light; a detection step of detecting the reflected light from the electrophotographic photoreceptor by a photo-detecting means; and an analysis step of analyzing a detection signal in the detected reflected light. The detection signal is obtained by detecting light of at least two wavelengths, in which the difference in the reflectance between the first portion and the second portion is different from the difference at other wavelengths. When at least two wavelengths are denoted byλa [nm] andλb [nm] in the at least two wavelengths, the wavelengths satisfy expressions ofλb>λa andλa+4L(2s-1)/(m(m-2s+1))+10>λb>λa+4L(2s-1)/(m(m-2s+1))-10m, wherein s is a natural number satisfying m>2s-1 and L (nm) is a product of the layer thickness and the refractive index of the surface layer. COPYRIGHT: (C)2011,JPO&INPIT
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