发明名称 |
GLOBAL PLANARIZATON FOR AN ELECTRODE OF A CONTACT-TYPE CAPACITIVE SENSOR |
摘要 |
PURPOSE: A global planarization method for electrode of contact-type capacitive sensor, which flattens an electrode pattern, in which metal is filled, toward a substrate of a non-metallic material is provided to reduce signal noise by pattern collision. CONSTITUTION: A global planarization method for electrode of contact-type capacitive sensor is as follows. Each substrate(100) of a moving element and a fixed element is etched in fixed shape. An electrode material(200) is filled in the etched place. CMP is performed until the filled electrode material has fixed depth. A coating layer is evaporated on the formed electrode. The substrate is composed of a glass wafer. The electrode material is made of chrome.
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申请公布号 |
KR20100117832(A) |
申请公布日期 |
2010.11.04 |
申请号 |
KR20090036498 |
申请日期 |
2009.04.27 |
申请人 |
POSTECH ACADEMY-INDUSTRY FOUNDATION |
发明人 |
KANG, DAE SIL;MOON, WON KYU |
分类号 |
G01L1/14;H01L21/304;H01L29/84 |
主分类号 |
G01L1/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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