发明名称 GLOBAL PLANARIZATON FOR AN ELECTRODE OF A CONTACT-TYPE CAPACITIVE SENSOR
摘要 PURPOSE: A global planarization method for electrode of contact-type capacitive sensor, which flattens an electrode pattern, in which metal is filled, toward a substrate of a non-metallic material is provided to reduce signal noise by pattern collision. CONSTITUTION: A global planarization method for electrode of contact-type capacitive sensor is as follows. Each substrate(100) of a moving element and a fixed element is etched in fixed shape. An electrode material(200) is filled in the etched place. CMP is performed until the filled electrode material has fixed depth. A coating layer is evaporated on the formed electrode. The substrate is composed of a glass wafer. The electrode material is made of chrome.
申请公布号 KR20100117832(A) 申请公布日期 2010.11.04
申请号 KR20090036498 申请日期 2009.04.27
申请人 POSTECH ACADEMY-INDUSTRY FOUNDATION 发明人 KANG, DAE SIL;MOON, WON KYU
分类号 G01L1/14;H01L21/304;H01L29/84 主分类号 G01L1/14
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