发明名称 CHARGED PARTICLE BEAM DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To solve a problem in a conventional SEM, wherein the focus cannot be adjusted in a charged sample, or magnification cannot be correctly calculated, whereby a correct pattern dimension cannot be measured. <P>SOLUTION: A retarding voltage is swept between a retarding voltage, with a primary electron beam not reaching a sample and a retarding voltage with the primary electron beam reaching the sample; the output of a secondary electron detector is detected, to acquire the retarding voltage and characteristics of the output of the secondary electron detector; and the potential of a sample surface is obtained based on the shift of the retarding voltage and the characteristics of the output of the secondary electron detector. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010251338(A) 申请公布日期 2010.11.04
申请号 JP20100179923 申请日期 2010.08.11
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 KOMURO OSAMU;NASU OSAMU
分类号 H01J37/28 主分类号 H01J37/28
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