| 摘要 |
<P>PROBLEM TO BE SOLVED: To form a color filter thin film system which includes a dense thin film and includes spectral properties stable against temperatures and air humidity. <P>SOLUTION: In the formation of the color filter thin film system pattern on some one base material, a patterned resist thin film (32) having a resist thin film surface region and a region where a resist thin film is not present is mounted by a lift-off method, and next a color filter thin film system (31) is mounted, and after that, the color filter thin film system mounted on the resist thin film surface region is removed together with the resist thin film surface region. The mounting of the color filter thin film system (31) is carried out by film forming using plasma at a temperature up to a maximum of 150°C. <P>COPYRIGHT: (C)2011,JPO&INPIT |
