LITHOGRAPHIC APPARATUS AND METHOD

摘要

A method of projecting a patterned beam onto a substrate using an EUV lithographic apparatus having a projection system (PS) including a plurality of mirrors (12-16). The method includes the following steps. Using the projection system (PS) to project the patterned beam onto the substrate (W) while moving a final mirror (16) of the projection system (PS) in a direction substantially perpendicular to the surface of the substrate (W). Rotating the final mirror (16) to substantially compensate for unwanted translation of the projected patterned radiation beam on the substrate due to the movement of the mirror.