| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a system and method for control of a semiconductor manufacturing apparatus, capable of achieving optimal wafer transfer control for the semiconductor manufacturing apparatus with a plurality of processing chambers, and capable of increasing the efficiency by shortening the lead time of semiconductor manufacturing. <P>SOLUTION: A transfer control decision unit 12 of a processing designation device 10 instructs the processing operation of the semiconductor manufacturing apparatus which processes semiconductor wafers in lots. The transfer control decision unit calculates the average lead time of all inventory lots for each content of wafer transfer control, based on the device state data, and the data indicating the number of inventory lots acquired from an apparatus state data collection unit 11, the data indicating the wafer processing time and the inter-lot cleaning time acquired from a lot processing data collection unit 14, and the data indicating the content of wafer transfer control acquired from a transfer control database 13. The transfer control decision unit 12 selects the optimal content of wafer transfer control from the calculation results, and a processing designation unit 15 directs the semiconductor manufacturing apparatus 16 to perform wafer transfer according to the content of wafer transfer control thus selected. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
