| 摘要 |
PURPOSE: A substrate processing apparatus is provided to overcome a problem related to the formation of powder on the inner side of a bellows by forming a chamber without an insertion hole. CONSTITUTION: A space(11) is prepared in a chamber(10), and substrates(s) are processed in the space. A susceptor(90) is installed in the space and supports the substrates. The susceptor includes a first plate(60), a second plate(80), and an insulating plate(70). A gas supplying unit(30) sprays a processing gas toward the substrates. A heater(50) heats the substrates which are supported by the susceptor.
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