发明名称 IMPRINT APPARATUS
摘要 <p>PURPOSE: An imprint apparatus is provided to pattern functional patterns on the chemical layer of a substrate by pressing and separating a stamp and a substrate which is loaded on a stage. CONSTITUTION: A stage(4) is in parallel with a stamp(2), and a substrate is loaded on the stage. A transferring unit(6) transfers the stage toward the stamp. A tilting part(8) includes a plurality of tiling units which is in connection with the stage. A sensor(10) detects the flatness of the stamp and the stage. A tilt-driving part compensates the flatness of the stamp and the stage based on a detection signal from the sensor.</p>
申请公布号 KR20100117319(A) 申请公布日期 2010.11.03
申请号 KR20090035999 申请日期 2009.04.24
申请人 DMS CO., LTD. 发明人 PARK, HO YOUN;SHIN, TAE KYOUNG
分类号 H01L21/027 主分类号 H01L21/027
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