发明名称 Lithographic apparatus and device manufacturing method
摘要 An array of individually controllable elements includes elements, each formed of a stack of layers of dielectric material. At least one layer is an electro-optical material. The at least one layer's refractive index for radiation that is plane polarized in a given direction can be changed by application of a voltage in order to change the reflection/transmission characteristic of the boundary between this layer and the adjacent layer.
申请公布号 US7826035(B2) 申请公布日期 2010.11.02
申请号 US20070725499 申请日期 2007.03.20
申请人 ASML NETHERLANDS B.V. 发明人 BLEEKER ARNO JAN
分类号 G03B27/54;G02F1/03;G03F7/20;H01L21/027 主分类号 G03B27/54
代理机构 代理人
主权项
地址