发明名称 Substrate processing apparatus, parameter management system for substrate processing apparatus, parameter management method for substrate processing apparatus, program, and storage medium
摘要 A substrate processing apparatus which enables parameters for carrying out processing on substrates to be changed easily by a user. A storage device stores parameters that are for controlling the processing and are categorized into a plurality of categories. A control device carries out the processing on the substrate based on the parameters. A parameter changing device enables each of the parameters to be changed in accordance with the category of that parameter. A parameter category changing device changes the category of some of the parameters. A category change defining device is detachable from the substrate processing apparatus and specifies parameters whose category is to be changed out of the parameters. The parameter category changing device changes the category of each of the parameters specified by the category change defining device.
申请公布号 US7824934(B2) 申请公布日期 2010.11.02
申请号 US20070620261 申请日期 2007.01.05
申请人 TOKYO ELECTRON LIMITED 发明人 YAMAMOTO YOSHIHIRO;NAKAMURA YOSHIYUKI
分类号 H01L21/66 主分类号 H01L21/66
代理机构 代理人
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