发明名称 |
Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method |
摘要 |
An exposure apparatus exposes a substrate by projecting an image of a pattern onto the substrate via a projection optical system and a liquid that fills a gap between the projection optical system and the substrate. The exposure apparatus has a liquid recovery mechanism with a drive section powered by electric power supplied from a commercial power source and an uninterruptible power source separate from the commercial power source. When the commercial power source has a failure, the supply of electric power to the drive section is switched to the uninterruptible power source.
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申请公布号 |
US7826031(B2) |
申请公布日期 |
2010.11.02 |
申请号 |
US20060606935 |
申请日期 |
2006.12.01 |
申请人 |
NIKON CORPORATION |
发明人 |
HARA HIDEAKI;TAKAIWA HIROAKI;ARAI DAI |
分类号 |
G03B27/52;G03B27/32;G03B27/42;G03B27/58;G03F7/20;H01L21/027 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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