| 摘要 |
The invention provides an evaporation system which is one of deposition devices promoting an efficiency of utilizing an EL material and excellent in uniformity and throughput of forming an EL layer and an evaporation method therefor. Further, the invention provides a method of efficiently vapor-depositing an EL material to a large area substrate. Further, the invention provides a system capable of avoiding an impurity from mixing to the EL material. An evaporation system of the invention is featured in moving a substrate and an evaporation source relative to each other. That is, the invention is featured in that in the evaporation system, an evaporation source holder installed with a vessel filled with an evaporation material is moved by a certain pitch relative to a substrate or the substrate is moved by a certain pitch relative to the evaporation source. Further, the invention is featured in that a vessel is filled with a refined evaporation material and carried and thereafter, the vessel is directly installed to the evaporation system which is a deposition device to carry out evaporation. |
