| 发明名称 |
Elimination of stitch artifacts in a planar illumination area |
| 摘要 |
In one aspect, a planar illumination area includes two light-guide elements, each with an out-coupling region. At least a portion of each out-coupling region overlaps with at least a portion of the other. The overlapping region emits a substantially uniform light output power.
|
| 申请公布号 |
US7826698(B1) |
申请公布日期 |
2010.11.02 |
| 申请号 |
US20100771411 |
申请日期 |
2010.04.30 |
| 申请人 |
OREE, INC. |
发明人 |
MEIR NOAM;ZIMMERMANN MICHA;SHANI YOSI |
| 分类号 |
G02B6/26;F21V7/04;F21V8/00;G02F1/13357 |
主分类号 |
G02B6/26 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
