发明名称 |
Composition for low dielectric material, low dielectric material and method for production thereof |
摘要 |
A low dielectric material is produced by using a composition including a borazine ring-containing compound and a compound represented by the following formula as a solvent, and/or by annealing a composition comprising a borazine ring-containing compound under atmosphere of oxygen concentration not higher than 0.1 vol % at 200 to 600° C. In the following formula, Ra and Rc independently represent alkyl group or acyl group; Rb represents hydrogen atom or alkyl group; and n represents an integer of 1 to 5.
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申请公布号 |
US7824784(B2) |
申请公布日期 |
2010.11.02 |
申请号 |
US20080327117 |
申请日期 |
2008.12.03 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA;NIPPON SHOKUBAI CO., LTD. |
发明人 |
KUMADA TERUHIKO;NOBUTOKI HIDEHARU;YAMAMOTO TETSUYA;KAMIYAMA TAKUYA |
分类号 |
B05D1/00;B05D3/12;B32B9/00;C09K3/00;H01L21/312;H01L21/318 |
主分类号 |
B05D1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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