| 摘要 |
PURPOSE: A blank mask, a photo mask, and a manufacturing method thereof are provided to apply a fine pattern to the blank mask and the photo mask by adding a phase inversion layer. CONSTITUTION: A phase inversion layer, a shielding layer(30), or anti-reflection layer(40) is formed on a transparent substrate(10). The metallic component of a shielding layer is made of materials with Cr. The phase inversion layer, the shielding layer, or the anti-reflection layer is amorphous and is laminated with a reactive sputtering method. |
