发明名称 BEAM HOMOGENIZING METHOD FOR LASER LIFT OFF AND THE APPARATUS
摘要 PURPOSE: A beam homogenizing method for a laser lift off machine and an apparatus of the same are provided to prevent the crystal structure of a light emitting diode from being damaged. CONSTITUTION: The beam-eliminating ratio distribution of a beam blocking unit is matched with the energy distribution of the beam to be eliminated. The beam blocking unit is a reflecting plate or an absorbing plate. The reflectivity of the reflecting plate is determined by the shape or the number of reflective coating layers of the reflecting plate. The absorbancy of the absorbing plate is determined by the thickness of the absorbing plate.
申请公布号 KR20100116089(A) 申请公布日期 2010.10.29
申请号 KR20090034833 申请日期 2009.04.21
申请人 PARK, KEE YONG 发明人 PARK, KEE YONG
分类号 H01L21/02;H01L21/00 主分类号 H01L21/02
代理机构 代理人
主权项
地址