| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a process for efficiently, inexpensively and safely producing highly pure carbonyl difluoride which is an important compound notable as an etching gas or a cleaning gas for semiconductors. <P>SOLUTION: The process for producing carbonyl difluoride cpmprises reacting carbon monoxide, chlorine, and hydrogen fluoride in the presence of a catalyst in a gaseous state. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
