| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an interpenetrating polymer network structure having high thermal resistance, to provide a method of producing the interpenetrating polymer network structure, and to provide a polishing pad made of the interpenetrating polymer network structure. <P>SOLUTION: The method for producing the interpenetrating polymer network structure includes: a process of immersing a polymer molding body into a radically polymerizable composition A consisting of an ethylenic unsaturated compound A, a radical polymerization initiator A and a chain transfer agent A; a process of polymerizing the ethylenic unsaturated compound A while swelling the polymer molding body impregnated with the radically polymerizable composition A; a process of further immersing the polymer molding body in which the ethylenic unsaturated compound A is polymerized into a radically polymerizable composition B consisting of an ethylenic unsaturated compound B, a radical polymerization initiator B and a chain transfer agent B; and a process of polymerizing the ethylenic unsaturated compound B while swelling the polymer molding body which has the polymerized ethylenic unsaturated compound A therein and is impregnated with the radically polymerizable composition B, in this order. The polishing pad including the interpenetrating polymer network structure is also disclosed. <P>COPYRIGHT: (C)2011,JPO&INPIT |
