| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To form a film on a plastic container without generating arc discharge and without causing trouble. <P>SOLUTION: A film-forming apparatus which accommodates the plastic container 1 having a container neck part 1a so as to stand upside down in the inside of a film-forming chamber having a chamber lid on an upper part, and forms a film with a plasma CVD technique on an inner surface of the plastic container includes: an upper main chamber and a lower sub-chamber which are formed by dividing the inside of the film-forming chamber with a partition wall plate 6; a through-hole formed in a part of the partition wall plate, in which the container neck part of the plastic container is fixed; a spacer arranged in the main chamber so as to surround the plastic container; and a pawl 10 set on the partition wall plate. The film-forming apparatus seals the through-hole against a gas by transmitting an opening and closing operation for the chamber lid to the pawl through a pawl advancement cam placed in the spacer, thereby making the pawl hold and push down the container neck part of the plastic container to press and bring the container neck part closely in contact with the partition wall plate. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
