| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma processing method and device capable of securing, with a high degree of reliability, and achieving a desired resultant state of the processing in subjecting a workpiece to processing by atmospheric-pressure plasma. <P>SOLUTION: The plasma processing method includes a step of supplying a mixed gas 8 of inert gas and a reactive gas to a space 2 in the vicinity of a location where an atmospheric pressure is present, while applying an electric field for generating plasma 11, and a step of irradiating a workpiece (W) with the generated plasma 11 for subjecting the workpiece (W) to plasma processing. In this method, the concentration of the reactive gas of the mixed gas 8 supplied to the space 2 is detected by a gas concentration detection means 15, after which, based on the detection result, a control part 14 decides the capability, that is, whether the performance of the plasma 11 emitted to the workpiece (W) is acceptable or not. <P>COPYRIGHT: (C)2011,JPO&INPIT |
