摘要 |
<p>Disclosed is a cleaning agent for a silicon wafer, which contains at least an aqueous cleaning liquid and a water repellent cleaning liquid for providing at least recessed portions in a pattern of projections and recesses with water repellency during a cleaning process. The water repellent cleaning liquid contains a mixture of a water repellent compound, which contains a hydrophobic group and a reactive moiety that can be chemically bonded with Si of a silicon wafer, and an organic solvent that contains at least an alcohol solvent. By using the cleaning agent, the cleaning process, in which a pattern collapse is easily induced, can be improved.</p> |
申请人 |
CENTRAL GLASS COMPANY, LIMITED;KUMON, SOICHI;SAIO, TAKASHI;ARATA, SHINOBU;NANAI, HIDEHISA;AKAMATSU, YOSHINORI |
发明人 |
KUMON, SOICHI;SAIO, TAKASHI;ARATA, SHINOBU;NANAI, HIDEHISA;AKAMATSU, YOSHINORI |