发明名称 LITHOGRAPHIC APPARATUS AND DETECTOR APPARATUS.
摘要 An apparatus and method for detecting extreme ultraviolet (EUV) radiation is disclosed. The apparatus includes a detector having a top surface, a layer of scintillation material on the top surface of the detector, a layer of spacer material on the layer of scintillation material, and a spectral purity filter layer on the layer of spacer material. The method includes directing the EUV radiation through the spectral purity filter layer and through the spacer material layer. The spacer material layer may be disposed between the spectral purity filter layer and a layer of scintillation material. The method further includes detecting scintillation radiation emitted by the scintillation material using the detector.
申请公布号 NL2004444(A) 申请公布日期 2010.10.28
申请号 NL20102004444 申请日期 2010.03.23
申请人 ASML NETHERLANDS B.V., 发明人 NIKOLAEV, IVAN;WEHRENS, MARTIJN
分类号 G03F7/20 主分类号 G03F7/20
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