发明名称 METHOD AND APPARATUS FOR SEPARATING GAS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method and an apparatus for separating gasses, in each of which, impurities are removed effectively from the exhaust gas from a semiconductor production apparatus using krypton, xenon and neon to circularly reuse krypton etc. <P>SOLUTION: The method for separating gasses, namely, the method for separating/removing an impurity component in a gaseous mixture containing at least one of krypton, xenon and neon comprises: a catalytic reaction step of converting ammonia and nitrogen oxide in the impurity component into nitrogen and steam by using a denitration catalyst and removing at least any of ammonia and nitrogen oxide; a denitration step of converting nitrogen oxide into nitrogen and steam; a first adsorption/separation step of adsorbing/separating ammonia and steam; a second adsorption/separation step of adsorbing krypton, xenon and neon on a second adsorbent and discharging the difficult-to-adsorb impurity component; a desorption/recovery step of desorbing/recovering the gas component adsorbed on the second adsorbent at the second adsorption/separation step; and a third adsorption/separation step of bringing an easy-to-adsorb gas component into contact with a third adsorbent to adsorb/separate the easy-to-adsorb gas component. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2010241686(A) 申请公布日期 2010.10.28
申请号 JP20100166255 申请日期 2010.07.23
申请人 TAIYO NIPPON SANSO CORP 发明人 MATSUDA KUNIO;YAMAWAKI MASAYA;ISHIHARA YOSHIO
分类号 C01B23/00;B01D53/04;B01D53/26 主分类号 C01B23/00
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