发明名称 MARK POSITION DETECTION DEVICE AND MARK POSITION DETECTION METHOD, EXPOSURE APPARATUS USING SAME, AND DEVICE MANUFACTURING METHOD
摘要 The mark position detection device of the present invention, which detects a position of a mark provided on a substrate, includes an image sensor with changeable resolution and readout area, an optical system that directs light reflected from the mark to the image sensor, and a control unit configured to detect the position of the mark based on an output of the image sensor. The control unit performs a first position detection based on the output of the image sensor with a first resolution and a first readout area, and a second position detection based on the output of the image sensor with a second resolution, which has higher resolution than the first resolution, and a second readout area, which is determined to be narrower than the first readout area and lies within the first readout area based on the first position detection.
申请公布号 US2010271609(A1) 申请公布日期 2010.10.28
申请号 US20100760352 申请日期 2010.04.14
申请人 CANON KABUSHIKI KAISHA 发明人 TSUJIKAWA TAKURO
分类号 G03B27/54;G01B11/14 主分类号 G03B27/54
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