| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for recovering damage of a low dielectric constant insulating film, the method sufficiently recovering electrical characteristics of the low dielectric constant insulating film itself while suppressing oxidation of buried metal and generation of pattern defaults. SOLUTION: After processing of a low dielectric constant insulating film is completed, a damaged functional group generated in a surface of the low dielectric constant insulating film by the processing is substituted with a hydrophobic functional group (ST.2), and a damaged component present under a dense layer generated in the surface of the low dielectric constant insulating film by the substitution treatment is recovered by using an ultraviolet heat treatment (ST.3). COPYRIGHT: (C)2011,JPO&INPIT
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