| 摘要 |
PROBLEM TO BE SOLVED: To provide a groove forming method for a glass substrate, capable of precisely forming a groove having multiple steps on a glass substrate at low cost. SOLUTION: An etching protection film B having stepwise opening holes 21a to 23a is formed on a surface of a glass substrate 2. The etching protection film B and the glass substrate 2 are simultaneously etched so as to form grooves 9a to 9c having multiple steps corresponding to the stepwise opening holes 21a to 23a on the glass substrate 2. At that time, the etching protection film B having the stepwise opening holes 21a to 23a is an oxide film such as a TEOS oxide film or a nitride film. In the etching, an etching rate of the glass substrate 2 and an etching rate of the etching protection film B are differentiated, thereby determining the film thickness of each of the steps of the etching protection film B. COPYRIGHT: (C)2011,JPO&INPIT
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