| 摘要 |
Provided is a semiconductor device including: an MIM capacitor that includes a lower electrode, an upper electrode, and a capacitor insulating film formed between the lower electrode and the upper electrode; a first via hole that connects to the lower electrode and extends in a normal upward direction of a principal surface of the lower electrode; a second via hole that connects to the upper electrode and extends in a normal upward direction of a principal surface of the upper electrode; and a plurality of lower wiring lines that are formed under the lower electrode, in which formation areas of the first and second via holes overlap formation areas of the plurality of lower wiring lines when viewed in the normal direction of the principal surface of the upper electrode.
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