发明名称 POLISHING PAD AND METHOD OF MANUFACTURING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a polishing pad which does not have a tendency of producing scratches in the surface of an object to be polished and has an increased dressing properties, and also provide a method of manufacturing the polishing pad. <P>SOLUTION: In this polishing pad having a polishing layer made of non-foamed polyurethane, the non-foamed polyurethane is a reaction hardening body of a polyurethane material composition which includes an isocyanate-terminated prepolymer obtained by the reaction of a prepolymer material composition including diisocyanate, high molecular weight polyol, and low molecular weight polyol, an isocyanate degenerated body which is increased in volume by the addition of three or more diisocyanates, and a chain elongation agent. The added amount of the isocyanate degenerated body is 5-30 pts.wt based on 100 pts.wt of the isocyanate-terminated prepolymer. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010240769(A) 申请公布日期 2010.10.28
申请号 JP20090091391 申请日期 2009.04.03
申请人 TOYO TIRE & RUBBER CO LTD 发明人 NAKAI YOSHIYUKI;OGAWA KAZUYUKI;NAKAMURA KENJI
分类号 B24B37/24;C08G18/65;C08G18/79;C08J5/14;H01L21/304 主分类号 B24B37/24
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