| 发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.
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| 申请公布号 |
US2010270709(A1) |
申请公布日期 |
2010.10.28 |
| 申请号 |
US20100836543 |
申请日期 |
2010.07.14 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
MERTENS JEROEN JOHANNES SOPHIA MARIA;HOOGENDAM CHRISTIAAN ALEXANDER;JANSEN HANS;TINNEMANS PATRICIUS ALOYSIUS JACOBUS;VAN DEN SCHOOR LEON JOSEPH MARIA;DONDERS SJOERD NICOLAAS LAMBERTUS;STREEFKERK BOB |
| 分类号 |
B29C35/08;B29C35/02;G03F7/20;H01L21/027 |
主分类号 |
B29C35/08 |
| 代理机构 |
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