发明名称 HOLDER FOR SEMICONDUCTOR WAFER, AND METHOD OF DETACHING SEMICONDUCTOR WAFER
摘要 PROBLEM TO BE SOLVED: To provide a holder for semiconductor wafer, capable of suppressing the contamination of a semiconductor wafer accompanying the fouling of a contact holding layer, and to provide a method of detaching a semiconductor wafer. SOLUTION: The holder for semiconductor wafer has a support substrate 1 and the contact holding layer 10, which comes into detachable contact with a surface of the support substrate 1 to hold the semiconductor wafer W and which has flexibility, and serves for a solder reflow device in such a state that the semiconductor wafer W is held, wherein the support substrate 1 and contact holding layer 10 are formed in the same shape and size as the semiconductor wafer W, and heat resistance properties are respectively given to the support substrate 1 and contact holding layer 10. Also, a plurality of guide grooves 2 are formed in the surface-diameter direction of the support substrate 1, and by making a separation liquid 3 go into a plurality of guide grooves 2, the contact holding layer 10 is separated from the surface of the support substrate 1. A new contact holding layer 10 is used each time a new semiconductor wafer W is processed, thereby, the previous fouling of a contact holding layer 10 never moves to the new semiconductor wafer W. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010245245(A) 申请公布日期 2010.10.28
申请号 JP20090091780 申请日期 2009.04.06
申请人 SHIN ETSU POLYMER CO LTD 发明人 TSUJIHANA HAJIME;TANAKA KIYOFUMI;HOSONO NORIYOSHI;ODAJIMA SATOSHI
分类号 H01L21/683 主分类号 H01L21/683
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