| 摘要 |
An immersion lithographic apparatus is disclosed. The apparatus has a projection system configured to project a patterned radiation beam onto a target portion of the substrate, the projection system having a lower surface. The apparatus also has a liquid confinement structure defining, in use, in part with the lower surface and the substrate and/or substrate table, an immersion space, the immersion space comprising, in use, a liquid meniscus between a part of the lower surface facing a surface of the liquid confinement structure and a facing surface of the liquid confinement structure facing the part of the lower surface. The apparatus also has a pinning surface comprising a plurality of meniscus pinning features, the pinning surface being part of or on the part of the lower surface, or part of or on the facing surface of the liquid confinement structure, or part of or on both.
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