DEVICE FOR HIGH TEMPERATURE PULSED LASER DEPOSITION

摘要

The invention relates to a device for pulsed laser deposition, which device comprises: - a substrate mount with a substrate mounting surface for a substrate; - a target mount for a piece of target material arranged substantially parallel to and at a distance from the substrate mount; - a laser device for directing a laser beam on a piece of target material mounted on the target mount, such that a plasma plume of target material is generated and deposits on the substrate; - heating means for heating a substrate mounted on the substrate mount; and - a heat shield arranged between the substrate mount and the target mount for shielding the target from being heated by the heated substrate, wherein the heat shield comprises at least one passage opening for passage of at least the generated plasma plume.