| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus reducing deflection of a mask caused by its empty weight without using a mask bend plate, having no decline in throughput and no deterioration of accuracy. <P>SOLUTION: This exposure apparatus has an original plate stage 20 that holds and scans an original plate 21. The original plate stage 20 is provided with a vacuum mechanism 25 that adsorbs and holds the original plate 21, and an original plate stage base 24 having a contact surface that touches the rear surface of the pattern surface of the original plate 21. The original plate stage base 24 corrects the shape of the original plate 21, because the original plate 21 is sucked and stuck to the contact surface. <P>COPYRIGHT: (C)2011,JPO&INPIT |
