发明名称 |
SYSTEMS AND METHODS FOR CALIBRATING END EFFECTOR ALIGNMENT IN A PLASMA PROCESSING SYSTEM |
摘要 |
A method for calibrating alignment of an end effector with respect to a chuck in a plasma processing system is provided. The method including positioning the end effector over the chuck and taking a still image of the chuck and the end effector. The method including processing the still image to ascertain the center of the chuck and the end effector-defined center defined by the end effector. The method including determining a positional difference between the end effector-defined center and the center of the chuck. The method also including providing the positional difference to a robot controller to control a robot mechanism to adjust the positional difference when the end effector transports a wafer
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申请公布号 |
US2010271229(A1) |
申请公布日期 |
2010.10.28 |
申请号 |
US20080810776 |
申请日期 |
2008.12.19 |
申请人 |
ALLEN-BLANCHETTE CHRISTINE;RODNICK MATT |
发明人 |
ALLEN-BLANCHETTE CHRISTINE;RODNICK MATT |
分类号 |
G08B5/00;G01P21/00 |
主分类号 |
G08B5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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