发明名称 |
METHOD AND APPARATUS FOR GROWING A THIN FILM ONTO A SUBSTRATE |
摘要 |
An apparatus and method of growing a thin film onto a substrate comprises placing a substrate in a reaction chamber and subjecting the substrate to surface reactions of a plurality of vapor-phase reactants according to the ALD method. Non-fully closing valves are placed into the reactant feed conduit and backsuction conduit of an ALD system. The non-fully closed valves are operated such that one valve is open and the other valve is closed during the purge or pulse cycle of the ALD process. |
申请公布号 |
WO2010123666(A2) |
申请公布日期 |
2010.10.28 |
申请号 |
WO2010US29558 |
申请日期 |
2010.04.01 |
申请人 |
ASM AMERICA, INC. |
发明人 |
WHITE, CARL, L.;SHERO, ERIC, J.;PEUSSA, MARKO |
分类号 |
H01L21/205;C23C16/455 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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