| 摘要 |
Disclosed is a processing apparatus which can realize highly fine batch pattern film formation for a mask, which is significantly increased in weight according to the demand for increasing the size of an object to be processed, whereby leading to a possibility of reduction in the alignment accuracy of a pattern. The processing apparatus 1 which fixes and processes an object to be processed 300 and a mask 200 includes a base 400 on which the object to be processed 300 and the mask 200 are placed. The processing apparatus 1 further includes second fixing means 101 and first fixing means 102. The second fixing means 101 includes a permanent magnet for use in fixing a mask frame 200a of the mask 200 on the base 400. The first fixing means 102 includes a permanent magnet for use in fixing a mask membranous plane 200b of the Mask 200 on the base 400. The second fixing means 101 and the first fixing means 102a, 102b are mechanisms in which each permanent magnet can move the base 400 in a vertical direction.
|
