发明名称 DUAL TREATED SILICA, METHODS OF MAKING DUAL TREATED SILICA, AND INKJET RECORDING MATERIALS
摘要 Briefly described, embodiments of this disclosure include methods of preparing dual treated silica, methods of preparing a photobase porous medium, photobase porous media, are disclosed.
申请公布号 EP2242720(A1) 申请公布日期 2010.10.27
申请号 EP20080728111 申请日期 2008.01.23
申请人 HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. 发明人 COURTENAY, SILKE;BURCH, ERIC L.;CHEN, TAO;ZAHROBSKY, PETER C.;STEICHEN, CHRISTINE E.;CHOW, JOSEPH SAI HIM;ROSSING, DAVID P.
分类号 C01B33/12;B41M5/50;C09C1/30 主分类号 C01B33/12
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