发明名称 |
PROCESS FOR PREPARING SINGLE CRYSTAL SILICON USING CRUCIBLE ROTATION TO CONTROL TEMPERATURE GRADIENT |
摘要 |
<p>The present invention is directed to a process for preparing single crystal silicon, in ingot or wafer form, wherein crucible rotation is utilized to control the average axial temperature gradient in the crystal, G0, as a function of radius (i.e.. G0(r)), particularly at or near the central axis. Additionally, crucible rotation modulation is utilized to obtain an axially uniform oxygen content therein.</p> |
申请公布号 |
EP1560951(B1) |
申请公布日期 |
2010.10.27 |
申请号 |
EP20030779446 |
申请日期 |
2003.10.31 |
申请人 |
MEMC ELECTRONIC MATERIALS, INC. |
发明人 |
LU, ZHENG;KIMBEL, STEVEN L;TAO, YING |
分类号 |
C30B15/30;C30B15/00;C30B29/06 |
主分类号 |
C30B15/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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