发明名称 Method for forming thin organic semiconductor material film and method for producing organic thin-film transistor
摘要 <p>A method for the formation of an organic semiconductor material film having improved mobility on a substrate, and a process for producing an organic thin film transistor which can develop high performance by utilizing the method. The production process of an organic thin film transistor utilizes the method for organic semiconductor material film formation, comprising coating an organic semiconductor material-containing liquid onto a surface of a substrate to form a semiconductor material thin film. The method for organic semiconductor material thin film formation is characterized in that, when the surface free energy of the surface of the substrate is gammaS=gammaSd+gammaSp+gammaSh (wherein gammaSd, gammaSp, and gammaSh each represent a non-polar component, a polar component, and a hydrogen bond component of the surface free energy of the solid surface based on the Young-Fowkes equation), and a surface free energy of a solvent in the aforesaid liquid is represented by gammaL=gammaLd+gammaLp+gammaLh (wherein gammaLd, gammaLp, and gammaLh each represent a non-polar component, a polar component, and a hydrogen bond component of the surface free energy of liquid based on the Young-Fowkes equation), gammaSh-gammaLh value is in the range of -5 to 20 (mN/m) and hydrogen bond component gammaSh is 0<gammaSh<20 (mN/m).</p>
申请公布号 GB2441702(B) 申请公布日期 2010.10.27
申请号 GB20070024500 申请日期 2006.05.23
申请人 KONICA MINOLTA HOLDINGS, INC 发明人 REIKO SUGISAKI;CHIYOKO TAKEMURA;KATSURA HIRAI
分类号 H01L51/00;H01L21/336;H01L21/368;H01L51/05 主分类号 H01L51/00
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