发明名称 Methods of fabricating vertical carbon nanotube field effect transistors for arrangement in arrays and field effect transistors and arrays formed thereby
摘要 A method for forming carbon nanotube field effect transistors, arrays of carbon nanotube field effect transistors, and device structures and arrays of device structures formed by the methods. The methods include forming a stacked structure including a gate electrode layer and catalyst pads each coupled electrically with a source/drain contact. The gate electrode layer is divided into multiple gate electrodes and at least one semiconducting carbon nanotube is synthesized by a chemical vapor deposition process on each of the catalyst pads. The completed device structure includes a gate electrode with a sidewall covered by a gate dielectric and at least one semiconducting carbon nanotube adjacent to the sidewall of the gate electrode. Source/drain contacts are electrically coupled with opposite ends of the semiconducting carbon nanotube to complete the device structure. Multiple device structures may be configured either as a memory circuit or as a logic circuit.
申请公布号 US7820502(B2) 申请公布日期 2010.10.26
申请号 US20070926627 申请日期 2007.10.29
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 FURUKAWA TOSHIHARU;HAKEY MARK CHARLES;HOLMES STEVEN JOHN;HORAK DAVID VAOLAV;KOBURGER, III CHARLES WILLIAM;MITCHELL PETER H.;NESBIT LARRY ALAN
分类号 H01L21/8238;G11C13/02;H01L21/336;H01L27/28;H01L51/05;H01L51/30;H01L51/40 主分类号 H01L21/8238
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