发明名称 Method and apparatus for flatband voltage tuning of high-k field effect transistors
摘要 In one embodiment, the invention is a method and apparatus for flatband voltage tuning of high-k field effect transistors. One embodiment of a field effect transistor includes a substrate, a high-k dielectric layer deposited on the substrate, a gate electrode deposited on the high-k dielectric layer, and a dipole layer positioned between the substrate and the gate electrode, for shifting the threshold voltage of the field effect transistor.
申请公布号 US7821081(B2) 申请公布日期 2010.10.26
申请号 US20080133817 申请日期 2008.06.05
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 GUHA SUPRATIK;NARAYANAN VIJAY;PARUCHURI VAMSI K.
分类号 H01L29/76;H01L27/108;H01L29/792;H01L29/94;H01L31/062;H01L31/113;H01L31/119 主分类号 H01L29/76
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