发明名称 Process for making contact with and housing integrated circuits
摘要 A process for producing electrical contact connections for a component integrated in a substrate material is provided, the substrate material having a first surface region, and at least one terminal contact being arranged at least partially in the first surface region for each component, which is distinguished in particular by application of a covering to the first surface region and production of at least one contact passage which, in the substrate material, runs transversely with respect to the first surface region, in which process, in order to form at least one contact location in a second surface region which is to be provided, at least one electrical contact connection from the contact location to at least one of the terminal contacts is produced via the respective contact passages.
申请公布号 US7821106(B2) 申请公布日期 2010.10.26
申请号 US20080042108 申请日期 2008.03.04
申请人 SCHOTT AG 发明人 BIECK FLORIAN;LEIB JUERGEN
分类号 H01L23/52;H01L29/40;H01L;H01L21/00;H01L21/3205;H01L21/44;H01L21/76;H01L21/768;H01L23/00;H01L23/12;H01L23/31;H01L23/485;H01L25/16;H01L27/146;H01L31/02;H01L31/0203 主分类号 H01L23/52
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