发明名称 |
Mask defect inspection computer program product |
摘要 |
A mask defect inspecting method comprises preparing detection sensitivities of defects on a plurality of portions of a mask pattern on a photomask, the detection sensitivities being determined according to influences of the defects upon a wafer, and inspecting defects on the plurality of portions based on the detection sensitivities.
|
申请公布号 |
US7821628(B2) |
申请公布日期 |
2010.10.26 |
申请号 |
US20070980640 |
申请日期 |
2007.10.31 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
YAMAGUCHI SHINJI;INOUE SOICHI;TANAKA SATOSHI;INOUE MARI |
分类号 |
G01N21/00;H01L21/027;G03F1/00 |
主分类号 |
G01N21/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|