发明名称 Method of forming front contacts to a silicon solar cell without patterning
摘要 A method for forming front contacts on a silicon solar cell which includes texture etching the front surface of the solar cell, forming an antireflective layer over the face, diffusing a doping material into the face to form a heavily doped region in valleys formed during the texture-etching of the face, depositing an electrically conductive material on the heavily doped regions in the valleys and annealing the solar cell.
申请公布号 US7820472(B2) 申请公布日期 2010.10.26
申请号 US20080291917 申请日期 2008.11.13
申请人 APPLIED MATERIALS, INC. 发明人 BORDEN PETER;DUKOVIC JOHN;XU LI
分类号 H01L21/00 主分类号 H01L21/00
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