发明名称 Semiconductor device including trench gate transistor and method of forming the same
摘要 A semiconductor device includes an active region having a groove, a gate insulating film, and a gate electrode. The gate electrode may include first and second layers. The first layer extends along the gate insulating film. The first layer is electrically conductive. The second layer extends along the first layer. The second layer is separate from the gate insulating film by the first layer.
申请公布号 US7821060(B2) 申请公布日期 2010.10.26
申请号 US20080219197 申请日期 2008.07.17
申请人 ELPIDA MEMORY, INC. 发明人 KITAMURA YOSHIHIRO;MIYAZAKI TORU
分类号 H01L29/76 主分类号 H01L29/76
代理机构 代理人
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